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Secondary neutral mass spectrometry: a powerful technique for quantitative elemental and depth profiling analyses of nanostructures

The purpose of this article is to give a comparative description of two methods applying ion-beam sputtering in materials research: secondary ion and neutral mass spectrometries (SIMS and SNMS). We shall illustrate the application of the latter by reports on a compositional analysis of perovskite oxides and on an investigation of nanoscaled multilayer structures.

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